据俄罗斯国际新闻通讯社报道，圣彼得堡理工大学的研究人员开发出了一种“国产光刻复合体”，可用于蚀刻生产无掩模芯片。该设备综合体包括用于无掩模纳米光刻和等离子体化学蚀刻的设备。与传统光刻技术相比，该技术在成本和时间方面都更加划算，因为传统光刻技术需要使用专门的掩膜板来获取图像。该装置由专业软件控制，可实现完全自动化。
该综合体旨在创建“各种微电子设备运行”所需的“纳米结构”。该工艺的第一阶段需要使用基础掩模光刻机，第二阶段则需要用到硅等离子化学蚀刻机。第二种装置需要用到第一阶段在基底上创建的图像。该项目的作者向俄新社保证，在这种机器上制作的硅膜“在可靠性和灵敏度方面超过了用液体或激光蚀刻方法制作的硅膜”。
俄罗斯工贸部下令开发用于微电子生产的光刻材料，特别是光刻胶的生产，而该部门将为这项工作拨款 11 亿卢布。圣彼得堡理工大学的研究人员开发的国产光刻复合体有助于解决俄罗斯在微电子领域的技术主权问题。
据称，俄罗斯现在正在建设 28nm 芯片工厂，而诺夫哥罗德应用物理研究所正在努力缩小俄罗斯与世界其他国家之间的巨大差距，他们的专家正在开发第一款国产光刻机，能够生产 7nm 拓扑芯片。然而，这需要数年时间，至少要到 2028 年才能开始全面运行。
新闻翻译：
Russian researchers have developed a domestic optical lithography composite for etching production of maskless chips. The device complex includes equipment for nanoscale lithography and plasma etching. Compared to traditional lithography technology, this technology is more cost-effective and time-efficient because traditional lithography requires the use of specialized mask plates to obtain images. The device is controlled by professional software and can achieve full automation.
The composite is aimed at creating the “nanostructure” required for various microelectronic device operation. The first stage requires the use of a base mask lithography machine, while the second stage requires a silicon plasma etching machine. The second device requires the use of the image created in the first stage on the substrate. The author of the project told 俄新社 that the silicon film produced in this machine is superior to those produced by liquid or laser etching methods in terms of reliability and sensitivity.
The Russian Ministry of Industry and Trade has ordered the development of lithographic materials for microelectronics production, especially lithographic solvents, and the department will allocate 11 billion rubles for this work. The domestic optical lithography composite developed by researchers at St. Petersburg State University helps to solve Russia’s issue of technological sovereignty in microelectronics.
It is said that Russia is currently building a 28nm chip factory, and the Nof 哥罗德 Institute of Applied Physics is working to close the gap between Russia and other countries in the world. Their experts are developing the first domestic lithography machine, which can produce 7nm topological chips. However, this will require several years and will not be fully operational until at least 2028.
【来源】https://www.ithome.com/0/723/788.htm
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